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High-resolution overlay alignment methods for imprint lithography
(United States Patent and Trademark Office, 2005-07-26)
A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed ...
Remote center compliant flexure device
(United States Patent and Trademark Office, 2008-10-07)
An apparatus to control displacement of a body spaced-apart from a surface includes a flexure system having a first flexure member defining a first axis of rotation and a second flexure member defining a second axis of ...
High resolution overlay alignment systems for imprint lithography
(United States Patent and Trademark Office, 2005-07-19)
A system of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed ...
Imprint lithography template having a feature size under 250 nm
(United States Patent and Trademark Office, 2007-06-12)
The present invention includes a template comprising a plurality of protrusions and a plurality of recessions with a distance between a zenith of any of the plurality of protrusions and a nadir of any one of the plurality ...
Device for holding a template for use in imprint lithography
(United States Patent and Trademark Office, 2010-05-04)
Described are imprint lithography templates, methods of forming and using the templates, and a template holder device. An imprint lithography template may include a body with a plurality of recesses on a surface of the ...
Method of varying template dimensions to achieve alignment during imprint lithography
(United States Patent and Trademark Office, 2005-07-12)
A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed ...
Step and flash imprint lithography
(United States Patent and Trademark Office, 2002-01-01)
A method of forming a relief image in a structure comprising a substrate and a transfer layer formed thereon comprises covering the transfer layer with a polymerizable fluid composition, and then contacting the polymerizable ...
Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks
(United States Patent and Trademark Office, 2007-12-04)
The present invention includes an imprint lithography system for impinging a flux of light upon a liquid to polymerize the liquid, the system including, a source of light producing the flux of light; and a template having ...
Method of determining alignment of a template and a substrate having a liquid disposed therebetween
(United States Patent and Trademark Office, 2007-03-06)
The present invention includes a method of aligning a substrate and a template spaced-apart from the substrate with an activating light curable liquid disposed therebetween, the substrate having substrate alignment marks ...
Methods for fabricating patterned features utilizing imprint lithography
(United States Patent and Trademark Office, 2006-10-17)
One embodiment of the present invention is a method for generating patterned features on a substrate that includes: (a) forming a first layer on at least a portion of a surface of the substrate, the first layer comprising ...