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    Method to control the relative position between a body and a surface 

    Sidlgata V. Sreenivasan; Stephen C. Johnson; Byung-Jin Choi (United States Patent and Trademark Office, 2005-10-18)
    A method to control a relative position between a surface and a body to form a pattern in the surface that features moving a body to obtain a desired relationship between the surface and the body. To that end, the method ...
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    Apparatus to control displacement of a body spaced-apart from a surface 

    Sidlgata V. Sreenivasan; Stephen C. Johnson; Byung-Jin Choi (United States Patent and Trademark Office, 2006-08-29)
    An apparatus to control displacement of a body spaced-apart from a surface includes a flexure system having a first flexure member defining a first axis of rotation and a second flexure member defining a second axis of ...
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    Remote center compliant flexure device 

    Sidlgata V. Sreenivasan; Stephen C. Johnson; Byung-Jin Choi (United States Patent and Trademark Office, 2008-10-07)
    An apparatus to control displacement of a body spaced-apart from a surface includes a flexure system having a first flexure member defining a first axis of rotation and a second flexure member defining a second axis of ...
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    High precision orientation alignment and gap control stages for imprint lithography processes 

    Sidlgata V. Sreenivasan; Stephen C. Johnson; Byung-Jin Choi (United States Patent and Trademark Office, 2005-03-29)
    Processes and associated devices for high precision positioning of a template an substrate during imprint lithography includes a calibration system with a course calibration stage and a fine orientation stage capable of ...
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    Apparatus to orientate a body with respect to a surface 

    Sidlgata V. Sreenivasan; Stephen C. Johnson; Byung-Jin Choi (United States Patent and Trademark Office, 2005-08-02)
    An apparatus to orientate a body with respect to a surface spaced-apart from the body. The apparatus comprises a flexure system having a first flexure member defining a first axis of rotation and a second flexure member ...
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    Method of orientating a template with respect to a substrate in response to a force exerted on the template 

    Sidlgata V. Sreenivasan; Stephen C. Johnson; Byung-Jin Choi (United States Patent and Trademark Office, 2006-06-13)
    The present invention includes a method of orientating a template with respect to a substrate spaced from the template, the method including, rotating the template about a first and a second axis to orientate the template ...
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    Apparatus to control displacement of a body spaced-apart from a surface 

    Sidlgata V. Sreenivasan; Stephen C. Johnson; Byung-Jin Choi (United States Patent and Trademark Office, 2008-05-20)
    An apparatus to control displacement of a body spaced-apart from a surface includes a flexure system having a first flexure member defining a first axis of rotation and a second flexure member defining a second axis of ...
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    Method of separating a template from a substrate during imprint lithography 

    Sidlgata V. Sreenivasan; Stephen C. Johnson; Byung-Jin Choi (United States Patent and Trademark Office, 2005-03-22)
    Processes and associated devices for high precision positioning of a template an substrate during imprint lithography includes a calibration system with a course calibration stage and a fine orientation stage capable of ...
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    Remote center compliant flexure device 

    Sidlgata V. Sreenivasan; Stephen C. Johnson; Byung-Jin Choi (United States Patent and Trademark Office, 2010-04-20)
    An apparatus to control displacement of a body spaced-apart from a surface includes a flexure system having a first flexure member defining a first axis of rotation and a second flexure member defining a second axis of ...
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    Use of step and flash imprint lithography for direct imprinting of dielectric materials for dual damascene processing 

    Willson, C. Grant; Nishimura, Yukio; Johnson, Stephen C.; Palmieri, Jr., Frank Anthony; Stewart, Michael D. (United States Patent and Trademark Office, 2010-04-06)
    In some embodiments, the present invention is directed to methods that involve the combination of step-and-flash imprint lithography (SFIL) with a multi-tier template to simultaneously pattern multiple levels of, for ...

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    AuthorByung-Jin Choi (9)Sidlgata V. Sreenivasan (9)
    Stephen C. Johnson (7)
    Stephen C. Johnson (3)C. Grant Willson (1)Nishimura, Yukio (1)Palmieri, Jr., Frank Anthony (1)Stewart, Michael D. (1)Subject
    B82Y10/00 (10)
    B82Y40/00 (10)G03F7/0002 (10)G03F9/00 (7)310/311 (3)310/323.17 (2)310/328 (2)355/72 (2)396/428 (2)430/22 (2)... View MoreDate Issued2005 (4)2006 (2)2008 (2)2010 (2)DepartmentBoard of Regents, University of Texas System (10)Has File(s)Yes (10)

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