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    System for creating a turbulent flow of fluid between a mold and a substrate 

    Nicholas A. Stacey; Daniel A. Babbs; Ronald D. Voisin; Duane J. Voth; Frank Y. Xu; Pankaj B. Lad; Ian McMackin; Van N. Truskett; Mathew P. Watts (United States Patent and Trademark Office, 2007-09-18)
    The present invention is directed toward a system for introducing a flow of a fluid between a mold, disposed on a template, and a substrate, the system including, a fluid supply system; and a chuck body having a baffle and ...
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    Method to reduce adhesion between a conformable region and a pattern of a mold 

    Michael Watts; Nicholas A. Stacey; Frank Y. Xu; Byung-Jin Choi; Van Hong Truskett (United States Patent and Trademark Office, 2007-01-02)
    The present invention provides a method to reduce adhesion between a conformable region on a substrate and a pattern of a mold, which selectively comes into contact with the conformable region. The method features forming ...
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    Compositions for dark-field polymerization and method of using the same for imprint lithography processes 

    Carlton Willson; Nicholas A. Stacey (United States Patent and Trademark Office, 2011-03-15)
    The present invention provides a composition and a method of using the same to form a pattern on a substrate using imprint lithography employing dark-field polymerization. To that end, the composition includes a bis vinyl ...
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    Method of creating a turbulent flow of fluid between a mold and a substrate 

    Nicholas A. Stacey; Daniel A. Babbs; Ronald D. Voisin; Duane J. Voth; Frank Y. Xu; Pankaj B. Lad; Ian McMackin; Van N. Truskett; Mathew P. Watts (United States Patent and Trademark Office, 2009-05-12)
    The present invention is directed toward a method of controlling a turbulent flow of a fluid between a substrate and a template, and more specifically, controlling a turbulent flow of a fluid between droplets disposed on ...
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    Methods for fabricating patterned features utilizing imprint lithography 

    Michael Watts; Nicholas A. Stacey; Frank Y. Xu; Ecron D. Thompson (United States Patent and Trademark Office, 2006-10-17)
    One embodiment of the present invention is a method for generating patterned features on a substrate that includes: (a) forming a first layer on at least a portion of a surface of the substrate, the first layer comprising ...
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    Materials for imprint lithography 

    Michael Watts; Nicholas A. Stacey; Frank Y. Xu (United States Patent and Trademark Office, 2011-12-13)
    The present invention is directed to a material for use in imprint lithography that features a composition having a viscosity associated therewith and including a surfactant, a polymerizable component, and an initiator ...

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    Author
    Nicholas A. Stacey (6)
    Frank Y. Xu (5)Michael Watts (3)Daniel A. Babbs (2)Duane J. Voth (2)Ian McMackin (2)Pankaj B. Lad (2)Ronald D. Voisin (2)Van N. Truskett (2)Byung-Jin Choi (1)... View MoreSubject
    B82Y10/00 (6)
    B82Y40/00 (6)G03F7/0002 (6)264/293 (2)Y10S425/06 (2)Y10S425/815 (2)Y10S438/909 (2)216/9 (1)264/102 (1)264/264 (1)... View MoreDate Issued2007 (2)2011 (2)2006 (1)2009 (1)DepartmentBoard of Regents, University of Texas System (6)Has File(s)Yes (6)

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