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Anhydride copolymer top coats for orientation control of thin film block copolymers
(United States Patent and Trademark Office, 2015-10-13)
Random copolymer top coats are described that can be spin coated onto block copolymer thin films and used to control the interfacial energy of the top coat-block copolymer interface. The top coats are soluble in aqueous ...
Polylactide/silicon-containing block copolymers for nanolithography
(United States Patent and Trademark Office, 2017-12-05)
The present invention includes a diblock copolymer system that self-assembles at very low molecular weights to form very small features. In one embodiment, one polymer in the block copolymer contains silicon, and the other ...
Anhydride copolymer top coats for orientation control of thin film block copolymers
(United States Patent and Trademark Office, 2016-04-19)
The use of self-assembled block copolymer structures to produce advanced lithographic patterns relies on control of the orientation of these structures in thin films. In particular, orientation of cylinders and lamellae ...
Method for creating topographical patterns in polymers via surface energy patterned films and the marangoni effect
(United States Patent and Trademark Office, 2017-10-31)
Using a broadband light source and a photomask, surface energy gradients can be directly transferred into polymer films. The Marangoni effect causes high surface energy regions to rise upon heating the film. This leads to ...
Polylactide/silicon-containing block copolymers for nanolithography
(United States Patent and Trademark Office, 2015-09-01)
A diblock copolymer system that self-assembles at very low molecular weights to form very small features is described. One polymer in the block copolymer contains silicon, and the other polymer is a polylactide. The block ...
Ordering block copolymers
(United States Patent and Trademark Office, 2017-11-21)
A method for ordering block copolymers including forming a first layer having a first preference mode; and providing a reactive agent in selected regions of the first layer that modifies the selected regions to a second ...
Ordering block copolymers
(United States Patent and Trademark Office, 2017-01-31)
A method for ordering block copolymers including forming a first layer having a first preference mode; and providing a reactive agent in selected regions of the first layer that modifies the selected regions to a second ...
Surface treatments for alignment of block copolymers
(United States Patent and Trademark Office, 2015-09-01)
The present invention relates to a method the synthesis and utilization of random, cross-linked, substituted polystyrene copolymers as polymeric cross-linked surface treatments (PXSTs) to control the orientation of physical ...