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    Method to control the relative position between a body and a surface 

    Sidlgata V. Sreenivasan; Stephen C. Johnson; Byung-Jin Choi (United States Patent and Trademark Office, 2005-10-18)
    A method to control a relative position between a surface and a body to form a pattern in the surface that features moving a body to obtain a desired relationship between the surface and the body. To that end, the method ...
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    Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks 

    Sidlgata V. Sreenivasan; Matthew E. Colburn; Byung-Jin Choi; Todd C. Bailey (United States Patent and Trademark Office, 2007-12-04)
    The present invention includes an imprint lithography system for impinging a flux of light upon a liquid to polymerize the liquid, the system including, a source of light producing the flux of light; and a template having ...
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    Method of determining alignment of a template and a substrate having a liquid disposed therebetween 

    Sidlgata V. Sreenivasan; Matthew E. Colburn; Byung-Jin Choi; Todd C. Bailey (United States Patent and Trademark Office, 2007-03-06)
    The present invention includes a method of aligning a substrate and a template spaced-apart from the substrate with an activating light curable liquid disposed therebetween, the substrate having substrate alignment marks ...
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    Method of orientating a template with respect to a substrate in response to a force exerted on the template 

    Sidlgata V. Sreenivasan; Stephen C. Johnson; Byung-Jin Choi (United States Patent and Trademark Office, 2006-06-13)
    The present invention includes a method of orientating a template with respect to a substrate spaced from the template, the method including, rotating the template about a first and a second axis to orientate the template ...
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    Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques 

    Sidlgata V. Sreenivasan; Byung-Jin Choi; Ecron D. Thompson; Anshuman Cherala (United States Patent and Trademark Office, 2010-08-03)
    The present invention is directed towards a method for determining deformation parameters that a patterned device would undergo to minimize dimensional variations between a recorded pattern thereon and a reference pattern, ...

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    Author
    Byung-Jin Choi (5)
    Sidlgata V. Sreenivasan (5)Matthew E. Colburn (2)Stephen C. Johnson (2)Todd C. Bailey (2)Anshuman Cherala (1)Ecron D. Thompson (1)Subject
    430/30 (5)
    B82Y10/00 (5)B82Y40/00 (5)G03F7/0002 (5)G03F9/00 (4)430/22 (3)355/72 (2)396/428 (2)B29C2035/0827 (2)B29C2043/025 (2)... View MoreDate Issued2007 (2)2005 (1)2006 (1)2010 (1)DepartmentBoard of Regents, University of Texas System (5)Has File(s)Yes (5)

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