Now showing items 1-2 of 2
Compositions for dark-field polymerization and method of using the same for imprint lithography processes
(United States Patent and Trademark Office, 2011-03-15)
The present invention provides a composition and a method of using the same to form a pattern on a substrate using imprint lithography employing dark-field polymerization. To that end, the composition includes a bis vinyl ...
Methods for fabricating patterned features utilizing imprint lithography
(United States Patent and Trademark Office, 2006-10-17)
One embodiment of the present invention is a method for generating patterned features on a substrate that includes: (a) forming a first layer on at least a portion of a surface of the substrate, the first layer comprising ...