Now showing items 1-2 of 2
Compositions for dark-field polymerization and method of using the same for imprint lithography processes
(United States Patent and Trademark Office, 2011-03-15)
The present invention provides a composition and a method of using the same to form a pattern on a substrate using imprint lithography employing dark-field polymerization. To that end, the composition includes a bis vinyl ...
Materials for imprint lithography
(United States Patent and Trademark Office, 2011-12-13)
The present invention is directed to a material for use in imprint lithography that features a composition having a viscosity associated therewith and including a surfactant, a polymerizable component, and an initiator ...