Now showing items 1-2 of 2
High resolution overlay alignment systems for imprint lithography
(United States Patent and Trademark Office, 2005-07-19)
A system of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed ...
Template for room temperature, low pressure micro-and nano-imprint lithography
(United States Patent and Trademark Office, 2004-02-24)
Described are imprint lithography templates, methods of forming and using the templates, and a template holder device. An imprint lithography template may include a body with a plurality of recesses on a surface of the ...