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High-resolution overlay alignment methods for imprint lithography
(United States Patent and Trademark Office, 2005-07-26)
A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed ...
Method of varying template dimensions to achieve alignment during imprint lithography
(United States Patent and Trademark Office, 2005-07-12)
A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed ...
Imprint lithography template comprising alignment marks
(United States Patent and Trademark Office, 2005-01-11)
A system of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed ...
Dual wavelength method of determining a relative position of a substrate and a template
(United States Patent and Trademark Office, 2005-06-07)
The present invention includes a method of determining a relative position of a substrate and a template spaced-apart therefrom, the substrate having substrate alignment marks disposed thereon and the template having ...