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Dual wavelength method of determining a relative position of a substrate and a template
(United States Patent and Trademark Office, 2005-06-07)
The present invention includes a method of determining a relative position of a substrate and a template spaced-apart therefrom, the substrate having substrate alignment marks disposed thereon and the template having ...
Method of varying template dimensions to achieve alignment during imprint lithography
(United States Patent and Trademark Office, 2005-07-12)
A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed ...
High-resolution overlay alignment methods for imprint lithography
(United States Patent and Trademark Office, 2005-07-26)
A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed ...
Method of aligning a template with a substrate employing moire patterns
(United States Patent and Trademark Office, 2006-01-17)
The present invention includes a method of determining an alignment between a substrate and a template spaced-apart from the substrate and having a distance defined therebetween, the substrate having a first pattern disposed ...
Imprint lithography template comprising alignment marks
(United States Patent and Trademark Office, 2005-01-11)
A system of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed ...