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High-resolution overlay alignment methods for imprint lithography
(United States Patent and Trademark Office, 2005-07-26)
A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed ...
Method of varying template dimensions to achieve alignment during imprint lithography
(United States Patent and Trademark Office, 2005-07-12)
A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed ...