High Pressure, Convectively-Enhanced Laser Chemical Vapor Deposition of Titanium
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Laser chemical vapor deposition is a freeform technique that can generate three-dimensional structures from organometallic or metal halide precursors. To obtain enhanced growth rates, a novel high pressure reactor has been constructed where impinging jets of volatile fluids are heatedand pyrolyzed to create parts. Argon Ion and Nd:YAG lasers have been used to selectively generate three-dimensional titanium shapes from titanium tetrachloride, titanium tetrabromide, and titanium tetraiodide, at pressures up to 3.0 atmospheres. Emission lines characteristic ofthe reaction rate have been identified which will allow feedback control ofthe reaction rate. The process is being optimized to obtain high deposition rates, energy efficiency, and desirable material morphologies. A feedback control system is required to generate 3-D structures with dimensional accuracy and predictable deposition rates.