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dc.creatorChurina, I. V.en_US
dc.creatorCho, B. I.en_US
dc.creatorBernstein, A.en_US
dc.creatorStoker, D. S.en_US
dc.creatorDalton, A.en_US
dc.creatorSymes, D. R.en_US
dc.creatorDitmire, T.en_US
dc.date.accessioned2017-07-18T20:10:15Z
dc.date.available2017-07-18T20:10:15Z
dc.date.issued2009-07en_US
dc.identifierdoi:10.15781/T2RR1Q29S
dc.identifier.citationChurina, I. V., B-I. Cho, Aaron Bernstein, D. S. Stoker, A. Dalton, D. R. Symes, and T. Ditmire. "Single-shot optical conductivity measurement of dense aluminum plasmas." Physical Review E 80, no. 1 (2009): 015401.en_US
dc.identifier.issn1539-3755en_US
dc.identifier.urihttp://hdl.handle.net/2152/61118
dc.description.abstractThe optical conductivity of a dense femtosecond laser-heated aluminum plasma heated to 0.1-1.5 eV was measured using frequency-domain interferometry with chirped pulses, permitting simultaneous observation of optical probe reflectivity and probe pulse phase shift. Coupled with published models of bound-electron contributions to the conductivity, these two independent experimental data yielded a direct measurement of both real and imaginary components of the plasma conductivity.en_US
dc.description.sponsorshipDOE National Nuclear Security Administration DE-FC52-03NA00156en_US
dc.language.isoEnglishen_US
dc.relation.ispartofUT Faculty/Researcher Worksen_US
dc.rightsAdministrative deposit of works to Texas ScholarWorks: This works author(s) is or was a University faculty member, student or staff member; this article is already available through open access or the publisher allows a PDF version of the article to be freely posted online. The library makes the deposit as a matter of fair use (for scholarly, educational, and research purposes), and to preserve the work and further secure public access to the works of the University.en_US
dc.subjectelectrical-conductivityen_US
dc.subjectsimple metalen_US
dc.subjectabsorptionen_US
dc.subjectinterferometryen_US
dc.subjecttemperatureen_US
dc.subjectwavesen_US
dc.titleSingle-shot optical conductivity measurement of dense aluminum plasmasen_US
dc.typeArticleen_US
dc.description.departmentPhysicsen_US
dc.rights.restrictionopenen_US
dc.identifier.doi10.1103/PhysRevE.80.015401en_US
dc.contributor.utaustinauthorChurina, I. V.en_US
dc.contributor.utaustinauthorCho, B. I.en_US
dc.contributor.utaustinauthorBernstein, A.en_US
dc.contributor.utaustinauthorStoker, D. S.en_US
dc.contributor.utaustinauthorDalton, A.en_US
dc.contributor.utaustinauthorSymes, D. R.en_US
dc.contributor.utaustinauthorDitmire, T.en_US
dc.relation.ispartofserialPhysical Review Een_US


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