• Login
    • Submit
    View Item 
    •   Repository Home
    • UT Faculty/Researcher Works
    • UT Faculty/Researcher Works
    • View Item
    • Repository Home
    • UT Faculty/Researcher Works
    • UT Faculty/Researcher Works
    • View Item
    JavaScript is disabled for your browser. Some features of this site may not work without it.

    Fluorinated Polymethacrylates as Highly Sensitive Non-chemically Amplified E-beam Resists

    Icon
    View/Open
    FluorinatedPoymethacrylates.pdf (287.1Kb)
    Date
    2009-04
    Author
    Strahan, Jeff R.
    Adams, Jacob R.
    Jen, Wei-Lun
    Vanleenhove, Anja
    Neikirk, Colin C.
    Rochelle, Timothy
    Gronheid, Roel
    Willson, C. Grant
    Share
     Facebook
     Twitter
     LinkedIn
    Metadata
    Show full item record
    Abstract
    In an effort to improve upon the sensitivity of commercial non-chemically amplified e-beam resists, four polyacrylates functionalized with alpha-CF3 and/or CH2CF3 alkoxy substituents were studied. The alpha-CF3 substituent is known to increase backbone-scission efficiency while simultaneously eliminating acidic out-gassing and cross-linking known to occur in alpha-halogen substituted polyacrylates. Contrast curves for the polymeric alpha-CF3 acrylates, generated through e-beam exposure, showed the resists required an order of magnitude less dose than the current industry-standards, PMMA and ZEP. The fundamental sensitivity of these materials to backbone scissioning was determined via Co-60 gamma-ray irradiation. The chain scissioning, G(s), and cross-linking, G(x), values calculated from the resulting change in molecular weight demonstrated that all fluorinated resists possess higher G(s) values than either PMMA or ZEP and have no detectable G(x) values. Utilizing e-beam and EUV interference lithographies, the photospeed of PMTFMA was found to be 2.8x and 4.0x faster, respectively, than PMMA.
    Department
    Chemistry
    Subject
    e-beam
    PMMA
    ZEP
    G(s)
    G(x)
    EUV
    Transfer radical polymerization
    Size-exclusion chromotography
    Anionic-polymerization
    Methyl-methacrylate
    Ethyl
    2-Trifluoromethylacrylate
    Radiation degradation
    Electron beam
    Materials Science, Multidisciplinary
    Optics
    Physics, Multidisciplinary
    URI
    http://hdl.handle.net/2152/29418
    Citation
    Jeff R. Strahan, Jacob R. Adams, Wei-Lun Jen, Anja Vanleenhove, Colin C. Neikirk, Timothy Rochelle, Roel Gronheid, C. Grant Willson. Advances in Resist Materials and Processing Technology XXVI, 72733G (Apr., 2009); doi: 10.1117/12.813736
    Collections
    • UT Faculty/Researcher Works
    University of Texas at Austin Libraries
    • facebook
    • twitter
    • instagram
    • youtube
    • CONTACT US
    • MAPS & DIRECTIONS
    • JOB OPPORTUNITIES
    • UT Austin Home
    • Emergency Information
    • Site Policies
    • Web Accessibility Policy
    • Web Privacy Policy
    • Adobe Reader
    Subscribe to our NewsletterGive to the Libraries

    © The University of Texas at Austin

    Browse

    Entire RepositoryCommunities & CollectionsDate IssuedAuthorsTitlesSubjectsDepartmentThis CollectionDate IssuedAuthorsTitlesSubjectsDepartment

    My Account

    Login

    Information

    AboutContactPoliciesGetting StartedGlossaryHelpFAQs

    Statistics

    View Usage Statistics
    University of Texas at Austin Libraries
    • facebook
    • twitter
    • instagram
    • youtube
    • CONTACT US
    • MAPS & DIRECTIONS
    • JOB OPPORTUNITIES
    • UT Austin Home
    • Emergency Information
    • Site Policies
    • Web Accessibility Policy
    • Web Privacy Policy
    • Adobe Reader
    Subscribe to our NewsletterGive to the Libraries

    © The University of Texas at Austin