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Planarizing Material For Reverse-Tone Step And Flash Imprint Lithography
Reverse-tone Step and Flash Imprint Lithography (S-FIL/R) requires materials that can be spin coated onto patterned substrates with significant topography and that are highly-planarizing. Ideally, these planarizing materials ...
Particle Generation During Photoresist Dissolution
A lattice-type Monte Carlo based mesoscale model and simulation of the lithography process has been described previously . The model includes the spin coating, post apply bake, exposure, post exposure bake and development ...
Photobase Generator Assisted Pitch Division
The drive to sustain the improvements in productivity that derive from following Moore's law has led the semiconductor industry to explore new technologies that enable production of smaller and smaller features on semiconductor ...