Now showing items 1-3 of 3
Particle Generation During Photoresist Dissolution
A lattice-type Monte Carlo based mesoscale model and simulation of the lithography process has been described previously . The model includes the spin coating, post apply bake, exposure, post exposure bake and development ...
A Reaction Diffusion Model Of Pattern Formation In Clustering Of Adatoms On Silicon Surfaces
We study a reaction diffusion model which describes the formation of patterns on surfaces having defects. Through this model, the primary goal is to study the growth process of Ge on Si surface. We consider a two species ...
Photobase Generator Assisted Pitch Division
The drive to sustain the improvements in productivity that derive from following Moore's law has led the semiconductor industry to explore new technologies that enable production of smaller and smaller features on semiconductor ...