Deposition of epitaxial Si/Si-Ge/Ge and novel high-K gate dielectrics using remote plasma chemical vapor deposition

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Author

Chen, Xiao, 1972-

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Department

Materials Science and Engineering

Description

text

Subject(s)

Epitaxy
Thin films
Dielectrics
Plasma-enhanced chemical vapor deposition

Citable URI

http://hdl.handle.net/2152/11993

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UT Electronic Theses and Dissertations