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dc.contributor.advisorBanerjee, Sanjayen
dc.creatorLi, Hong-jyhen
dc.date.accessioned2011-05-16T21:14:18Zen
dc.date.available2011-05-16T21:14:18Zen
dc.date.issued2002-08en
dc.identifier.urihttp://hdl.handle.net/2152/11248en
dc.descriptiontexten
dc.description.abstractNot availableen
dc.format.mediumelectronicen
dc.language.isoengen
dc.rightsCopyright is held by the author. Presentation of this material on the Libraries' web site by University Libraries, The University of Texas at Austin was made possible under a limited license grant from the author who has retained all copyrights in the works.en
dc.subjectBoron compoundsen
dc.subjectIon implantationen
dc.subjectDiffusion--Computer simulationen
dc.titleUltra-shallow junction formation : co-implantation and rapid thermal annealingen
dc.description.departmentElectrical and Computer Engineeringen
thesis.degree.departmentElectrical and Computer Engineeringen
thesis.degree.disciplineElectrical and Computer Engineeringen
thesis.degree.grantorThe University of Texas at Austinen
thesis.degree.levelDoctoralen
thesis.degree.nameDoctor of Philosophyen
dc.rights.restrictionRestricteden


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