Now showing items 1-3 of 3
CAD for nanolithography and nanophotonics
As the semiconductor technology roadmap further extends, the development of next generation silicon systems becomes critically challenged. On the one hand, design and manufacturing closures become much more difficult due ...
Robust algorithms for area and power optimization of digital integrated circuits under variability
As device geometries shrink, variability of process parameters becomes pronounced, resulting in a significant impact on the power and timing performance of integrated circuits. Deterministic optimization algorithms for ...
Statistical algorithms for circuit synthesis under process variation and high defect density
As the technology scales, there is a need to develop design and optimization algorithms under various scenarios of uncertainties. These uncertainties are introduced by process variation and impact both delay and leakage. ...