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dc.contributor.advisorTasch, Al F.en
dc.creatorChen, Yang, 1973-en
dc.date.accessioned2011-03-07T17:04:40Zen
dc.date.available2011-03-07T17:04:40Zen
dc.date.issued2001-08en
dc.identifier.urihttp://hdl.handle.net/2152/10279en
dc.descriptiontexten
dc.description.abstractA physically-based model for ion implantation of any species into single crystal silicon and a few amorphous materials has been developed, tested and implemented in ion implant simulator UT-MARLOWE. In this model, an interpolation scheme, based on mathematical properties of ion-target interatomic potential, was employed and implemented to calculate the scattering process. Using this scheme, the resulting energy, direction and momentum of the ion and target can be derived from the existing scattering tables of UT-MARLOWE without calculating the whole scattering process. The method has advantages in both accuracy and computational efficiency, as well as significantly reduced cost of code development. The impurity profiles and damage profiles predicted by the model simulations have been compared with SIMS and RBS, and excellent agreement with experimental data has been achieved.
dc.format.mediumelectronicen
dc.language.isoengen
dc.rightsCopyright is held by the author. Presentation of this material on the Libraries' web site by University Libraries, The University of Texas at Austin was made possible under a limited license grant from the author who has retained all copyrights in the works.en
dc.subjectIon implantation--Mathematical modelsen
dc.subjectSilicon crystalsen
dc.titleA universal species ion implantation model for implants into topographically complex structures with multiple materialsen
dc.description.departmentElectrical and Computer Engineeringen
thesis.degree.departmentElectrical and Computer Engineeringen
thesis.degree.disciplineElectrical and Computer Engineeringen
thesis.degree.grantorThe University of Texas at Austinen
thesis.degree.levelDoctoralen
thesis.degree.nameDoctor of Philosophyen
dc.rights.restrictionRestricteden


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