• Development of virtual metrology in semiconductor manufacturing 

    Gill, Bhalinder Singh (2011-08)
    Virtual Metrology (VM) predicts end-of-batch properties (metrology data) from measurable input data composed of pre-process metrology and fault detection and classi cation (FDC) system outputs. This dissertation aims at ...
  • Improving process monitoring and modeling of batch-type plasma etching tools 

    Lu, Bo, active 21st century; 0000-0001-5100-5600 (2015-05)
    Manufacturing equipments in semiconductor factories (fabs) provide abundant data and opportunities for data-driven process monitoring and modeling. In particular, virtual metrology (VM) is an active area of research. ...
  • Integrated performance prediction and quality control in manufacturing systems 

    Bleakie, Alexander Q. (2014-12)
    Predicting the condition of a degrading dynamic system is critical for implementing successful control and designing the optimal operation and maintenance strategies throughout the lifetime of the system. In many situations, ...
  • Ion implant virtual metrology for process monitoring 

    Fowler, Courtney Marie (2009-12)
    This thesis presents the modeling of tool data produced during ion implantation for the prediction of wafer sheet resistance. In this work, we will use various statistical techniques to address challenges due to the nature ...