• Planarizing Material For Reverse-Tone Step And Flash Imprint Lithography 

      Ogawa, Tsuyoshi; Takei, Satoshi; Jacobsson, B. Michael; Deschner, Ryan; Bell, William; Lin, Michael W.; Hagiwara, Yuji; Hanabata, Makoto; Willson, C. Grant (2010)
      Reverse-tone Step and Flash Imprint Lithography (S-FIL/R) requires materials that can be spin coated onto patterned substrates with significant topography and that are highly-planarizing. Ideally, these planarizing materials ...