• Dual field nano precision overlay 

    Yin, Bailey Anderson (2010-08)
    Currently, the imprint lithography steppers are designed to only pattern one field of 26 x 33 mm at a time. This choice is based on the desire to mix-and-match to the standard optical lithography tools whose field size is ...
  • Evaluation and extension of threaded control for high-mix semiconductor manufacturing 

    Patwardhan, Ninad Narendra (2010-12)
    In the recent years threaded run-to-run (RtR) control algorithms have experienced drawbacks under certain circumstances, one such trait is when applied to high-mix of products such as in Application Specific Integrated ...
  • An investigation of means of mitigating alkali-silica reaction in hardened concrete 

    Markus, Reid Patrick (2013-05)
    This research project, funded by the Federal Highway Administration (FHWA Project DTFH61-02-C-0097), focuses mainly on alkali-silica reaction (ASR) and techniques to mitigate the effects of alkali-silica reaction in hardened ...
  • Large-scale network analytics 

    Song, Han Hee, 1978- (2011-08)
    Scalable and accurate analysis of networks is essential to a wide variety of existing and emerging network systems. Specifically, network measurement and analysis helps to understand networks, improve existing services, ...
  • Materials selection for concrete overlays 

    Kim, Dong-Hyun, 1984- (2011-08)
    Concrete overlays have been a rehabilitation method for many years. It has been extensively utilized and studied in other states, but Texas is still at an initial stage of fully implementing the method. The large volume ...
  • Nanometer VLSI design-manufacturing interface for large scale integration 

    Yang, Jae-Seok (2011-05)
    As nanometer Very Large Scale Integration (VLSI) demands more transistor density to fabricate multi-cores and memory blocks in a limited die size, many researches have been performed to keep Moore's Low in two different ...