• Fluorinated Polymethacrylates as Highly Sensitive Non-chemically Amplified E-beam Resists 

      Strahan, Jeff R.; Adams, Jacob R.; Jen, Wei-Lun; Vanleenhove, Anja; Neikirk, Colin C.; Rochelle, Timothy; Gronheid, Roel; Willson, C. Grant (2009-04)
      In an effort to improve upon the sensitivity of commercial non-chemically amplified e-beam resists, four polyacrylates functionalized with alpha-CF3 and/or CH2CF3 alkoxy substituents were studied. The alpha-CF3 substituent ...