| dc.contributor.advisor |
Lee, Jack Chung-Yeung |
| dc.creator |
Choi, Rino
|
| dc.date.accessioned |
2008-08-28T22:23:09Z |
| dc.date.available |
2008-08-28T22:23:09Z |
| dc.date.created |
2004 |
| dc.date.issued |
2008-08-28T22:23:09Z |
| dc.identifier.uri |
http://hdl.handle.net/2152/1907 |
| dc.description.abstract |
Not available |
| dc.format.medium |
electronic |
| dc.language.iso |
eng |
| dc.rights |
Copyright © is held by the author. Presentation of this material on
the Libraries' web site by University Libraries, The University of Texas at Austin was made
possible under a limited license grant from the author who has retained all copyrights in
the works. |
| dc.subject.lcsh |
Dielectrics
|
| dc.subject.lcsh |
Hafnium compounds
|
| dc.subject.lcsh |
Hafnium oxide
|
| dc.subject.lcsh |
Silicates
|
| dc.subject.lcsh |
Metal oxide semiconductor field-effect transistors
|
| dc.title |
Processing and reliability studies on hafnium oxide and hafnium silicate for the advanced gate dielectric application |
| dc.description.department |
Materials Science and Engineering
|
| dc.identifier.oclc |
67134608 |
| dc.identifier.proqst |
3143668 |
| dc.identifier.recnum |
b60728668 |
| dc.type.genre |
Thesis |
| dc.type.material |
text |
| thesis.degree.department |
Materials Science and Engineering
|
| thesis.degree.discipline |
Materials Science and Engineering |
| thesis.degree.grantor |
The University of Texas at Austin |
| thesis.degree.level |
Doctoral |
| thesis.degree.name |
Doctor of Philosophy |
