Processing and reliability studies on hafnium oxide and hafnium silicate for the advanced gate dielectric application

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Processing and reliability studies on hafnium oxide and hafnium silicate for the advanced gate dielectric application

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Title: Processing and reliability studies on hafnium oxide and hafnium silicate for the advanced gate dielectric application
Author: Choi, Rino
Abstract: Not available
Department: Materials Science and Engineering
Subject: Dielectrics Hafnium compounds Hafnium oxide Silicates Metal oxide semiconductor field-effect transistors
URI: http://hdl.handle.net/2152/1907
Date: 2004

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