Design and synthesis of materials for 157 nm photoresists applications

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Design and synthesis of materials for 157 nm photoresists applications

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Title: Design and synthesis of materials for 157 nm photoresists applications
Author: Pinnow, Matthew James
Abstract: Not available
Department: Chemical Engineering
Subject: Photoresists--Materials Photolithography
URI: http://hdl.handle.net/2152/1689
Date: 2005

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