Design and synthesis of materials for 157 nm photoresists applications
| Title: | Design and synthesis of materials for 157 nm photoresists applications |
| Author: | Pinnow, Matthew James |
| Abstract: | Not available |
| Department: | Chemical Engineering |
| Subject: |
Photoresists--Materials
Photolithography |
| URI: | http://hdl.handle.net/2152/1689 |
| Date: | 2005 |
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