Imprint template advances and surface modification, and defect analysis for step and flash imprint lithography
Repository
Imprint template advances and surface modification, and defect analysis for step and flash imprint lithography
| Title: | Imprint template advances and surface modification, and defect analysis for step and flash imprint lithography |
| Author: | Bailey, Todd Christopher |
| Abstract: | Not available |
| Department: | Chemical Engineering |
| Subject: |
Semiconductors
Microlithography |
| URI: | http://hdl.handle.net/2152/1652 |
| Date: | 2003 |
Files in this work
This work appears in the following Collection(s)
-
UT Electronic Theses and Dissertations
ETD is a collection of UT Austin authored electronic dissertations.