Deposition of epitaxial Si/Si-Ge/Ge and novel high-K gate dielectrics using remote plasma chemical vapor deposition

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Deposition of epitaxial Si/Si-Ge/Ge and novel high-K gate dielectrics using remote plasma chemical vapor deposition

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Title: Deposition of epitaxial Si/Si-Ge/Ge and novel high-K gate dielectrics using remote plasma chemical vapor deposition
Author: Chen, Xiao, 1972-
Abstract: Not available
Department: Materials Science and Engineering
Subject: Epitaxy Thin films Dielectrics Plasma-enhanced chemical vapor deposition
URI: http://hdl.handle.net/2152/11993
Date: 2003-08

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