| Title: | The stability and performance of the EWMA and double-EWMA run-to-run controllers with metrology delay |
| Author: | Good, Richard Paul |
| Abstract: | Not available |
| Department: | Chemical Engineering |
| Subject: |
Semiconductor industry--Production control
Semiconductor industry--Quality control Semiconductors--Design and construction Process control |
| URI: | http://hdl.handle.net/2152/1167 |
| Date: | 2004 |