Ultra-shallow junction formation : co-implantation and rapid thermal annealing

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Ultra-shallow junction formation : co-implantation and rapid thermal annealing

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Title: Ultra-shallow junction formation : co-implantation and rapid thermal annealing
Author: Li, Hong-jyh
Abstract: Not available
Department: Electrical and Computer Engineering
Subject: Boron compounds Ion implantation Diffusion--Computer simulation
URI: http://hdl.handle.net/2152/11248
Date: 2002-08

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