Ultra-shallow junction formation : co-implantation and rapid thermal annealing
| Title: | Ultra-shallow junction formation : co-implantation and rapid thermal annealing |
| Author: | Li, Hong-jyh |
| Abstract: | Not available |
| Department: | Electrical and Computer Engineering |
| Subject: |
Boron compounds
Ion implantation Diffusion--Computer simulation |
| URI: | http://hdl.handle.net/2152/11248 |
| Date: | 2002-08 |
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