Ultra thin HfO₂ gate stack for sub-100nm ULSI CMOS technology
| Title: | Ultra thin HfO₂ gate stack for sub-100nm ULSI CMOS technology |
| Author: | Lee, Sungjoo |
| Abstract: | Not available |
| Department: | Electrical and Computer Engineering |
| Subject: |
Integrated circuits--Ultra large scale integration
Metal oxide semiconductors, Complementary |
| URI: | http://hdl.handle.net/2152/11036 |
| Date: | 2002-05 |
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