Ultra thin HfO₂ gate stack for sub-100nm ULSI CMOS technology

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Ultra thin HfO₂ gate stack for sub-100nm ULSI CMOS technology

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Title: Ultra thin HfO₂ gate stack for sub-100nm ULSI CMOS technology
Author: Lee, Sungjoo
Abstract: Not available
Department: Electrical and Computer Engineering
Subject: Integrated circuits--Ultra large scale integration Metal oxide semiconductors, Complementary
URI: http://hdl.handle.net/2152/11036
Date: 2002-05

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