Characterization of growth and thermal behaviors of thin films for the advanced gate stack grown by chemical vapor deposition

Repository

Characterization of growth and thermal behaviors of thin films for the advanced gate stack grown by chemical vapor deposition

Show full record

Title: Characterization of growth and thermal behaviors of thin films for the advanced gate stack grown by chemical vapor deposition
Author: Taek Soo, Jeon
Abstract: Not available
Department: Materials Science and Engineering
Subject: Thin films--Thermal properties Chemical vapor deposition
URI: http://hdl.handle.net/2152/11017
Date: 2002-05

Files in this work

Description: Restricted to EID users
Download File: jeont022.pdf
Size: 2.433Mb
Format: application/pdf

This work appears in the following Collection(s)

Show full record


Advanced Search

Browse

My Account

Statistics

Information