Synthesis, copolymerization studies and 157 nm photolithography applications of 2-trifluoromethylacrylates

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Synthesis, copolymerization studies and 157 nm photolithography applications of 2-trifluoromethylacrylates

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Title: Synthesis, copolymerization studies and 157 nm photolithography applications of 2-trifluoromethylacrylates
Author: Trinque, Brian C.
Abstract: Not available
Department: Chemistry Chemistry and Biochemistry
Subject: Polymers Photolithography
URI: http://hdl.handle.net/2152/1012
Date: 2003

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