Materials for advanced microlithography: polymers for 157 nm lithography and acid diffusion measurements

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Materials for advanced microlithography: polymers for 157 nm lithography and acid diffusion measurements

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Title: Materials for advanced microlithography: polymers for 157 nm lithography and acid diffusion measurements
Author: Tran, Hoang Vi
Abstract: Not available
Department: Chemistry Chemistry and Biochemistry
Subject: Microlithography--Materials Polymers
URI: http://hdl.handle.net/2152/1001
Date: 2002

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